What is Plasma Cleaning?

Reactive gas molecules form what is known as plasma. The ions and electrons in plasma are used to remove unwanted organic contaminants. Unwanted particles are removed through a vacuum system. This cleaning procedure creates an ideal sterilization process. In addition, plasma cleaning eliminates the need for expensive solvents since substrate surfaces can be cleaned via a chemical reaction within plasma molecules.  

Utilizing plasma in semiconductor manufacturing has many benefits. Firstly, it creates an easy and convenient substrate cleaning method. Plasma cleaning is conducted in a contained chamber with multiple gas supplies and a vacuum. Duration and other parameters can be adjusted by the user to achieve a desired cleaning cycle. Substrate properties can be enhanced through this process by improving adhesion and wettability and increasing surface energy.

How it works

The color of plasma can indicate which type of reactive gas is being used to form plasma. For instance, a purple color is created when introducing Nitrogen into the chamber. Check out the video below to view a cycle of plasma treatment with Nitrogen and Oxygen:  

Substrate Cleaning Method

The substrates within the chamber are being cleaned through the purple gas. This purple plasma is removing organic contaminants from the surface.  

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