Our Mission:

Empowering Fellow Scientists to Solve Our Greatest Challenges.

Our Services

Our core skills in Surface Science enable a broad portfolio of solutions for laboratory scientists.

Engineering Design

Read about our design capabilities for sensors and biosensors

Metal Coatings

Learn about our capabilities with e-beam evaporation.

Surface Patterning

Fabricate devices via photolithography and lift-off.

Cutting and Dicing

Discover our capabilities for device singulation.

Fluid Dispensing

Precision dispensing of fluid droplets and films.

Testing

Discover our extensive testing capabilities.

Heat Treatment

Learn about high-temperature processing.

Cleaning & Etching

Read about dry, wet, and ultrasonic surface treatments.

Our Vision:

To contribute to the global welfare by application of Surface Science in the development of tools and solutions for the Scientific Community.

Custom Solutions by Platypus Technologies

Have a special project in mind? We can help! Our team has extensive experience creating complex surfaces for biosensors, chemical sensors, and cell culture.

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The Latest From Platypus Technologies

Critical Benefits of Cell Invasion Assays

Cell-based assays are crucial for analyzing cell health, cytotoxicity, invasion, migration,  and many other biological and drug-discovery applications and cancer research. A cell invasion assay is one of many different types of assays. It measures cell movement across extracellular boundaries and how single cells respond to various chemo-attractants. This blog post will provide an overview of the critical benefits of cell invasion assays. 

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Photolithography & Adhesion 

A common problem that can occur during photolithography fabrication is adhesion of the photoresist to the substrate. A photoresist consists of a resin, sensitizer, adhesion promoter, and a thinner. Each component contributes to the overall photoresist properties. A resin is included to withstand an etchant solution that may be used in the later stages of fabrication. A sensitizer offers a photosensitive element to the resist that allows it to be exposed in certain areas and not in others. A thinner is included to modify the viscosity of the overall photoresist and make it easier to spin-coat onto the substrate. The included adhesion promoter is often not potent enough to provide enough strength between resist and substrate material.  

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