One of the main problems in microscopy is the movement of the specimen from beam irradiation during imaging which can lead to low-resolution images which are blurred. Carbon films on metal grids can cause this specimen drift. Using gold thin films instead of carbon can stop the drift as they are chemically inert and biocompatible, less fragile, extremely conductive and non-oxidizing. Gold thin metal films are often seen as the most significant signal amplification components in electrochemical and optical sensor applications. In surface plasmon resonance (SPR) applications, gold thin metal film has electron densities which have the plasmon frequencies in the visible light range.
Photolithography is an important microfabrication technique used to pattern substrates for modern electronics, sensors, and microfluidics. It is a precise form of custom surface fabrication where the interface of a wafer is coated with a light-sensitive polymer known as a photoresist. The coated wafer is then exposed to light which is selectively attenuated by a mask, leaving behind a latent image which is chemically, physically, or optically etched to provide a permanent micro-structured pattern on the wafer’s surface. Coupled with metal deposition and etching techniques, photolithography is a versatile method for fabricating microstructures for optics, chemical and bio-sensors, and microfluidic devices.