Our silicon wafers are 100 mm discs with thickness of 525 µm, and thermal oxide layer thickness of 285-nm +/- 5%. Gold film coated over titanium adhesion layer (to promote mechanical stability of thin film). Ideal for fabrication for sensors, biosensors and electrodes via photolithography and wet etching techniques.
Gold-coated silicon wafers, and gold-coated silicon chips are used extensively as substrates for analytical characterization of materials. For example, materials deposited onto gold-coated wafers can be analized via ellipsometry, Raman spectroscopy or infrared (IR) spectroscopy due to the high-reflectivity and favorable optical properties of gold. In addition, gold-coated silicon wafers are excellent substrates for fabricating electrodes, electrochemical sensors, self-assembled monolayers, photonic devices, and other advanced technologies.
Examples of Studies that Used Gold-Coated Products from Platypus Technologies:
D. Shaffer et al. “Electrochemical Impedance of LbL polyamide films” J. Mem.Sci. 2019. LINK
K. Fears et al. “Nanomaterials formed by cyclic β-peptide polymers” Nature Comm.2018. LINK
X. Liu et al. “Two-Photon Photochroism in Metasurface Perfect Absorbers” Nano Lett.2018. LINK
J.-S. Moon et al. “Bacteriophage-based photonic nose for cell recognition” Chem. Sci.2017. LINK
L. Slaughter et al. “Patterning monolayers via lift-off lithography” Beilstein J. Nano. 2017. LINK
T. Galloway et al. “Nanoparticles for enhanced Raman spectroscopy” Faraday Diss. 2017. LINK
Don’t see what you need? Contact us for custom gold coating projects on 608-237-1270 or email us.