Silicon Wafers with 100 nm Gold (12 wafers)

Description

High purity gold (99.999%) exhibits high electrical conductivity and high reflectivity.

Our gold coated wafers feature a thin titanium adhesion layer to ensure proper adhesion of the gold layer to the silicon substrate.

This product can be used as a substrate for analytical characterization of thin films, nanoparticles, proteins and self-assembled monolayers via electrochemistry, IR spectroscopy, Raman spectroscopy, X-ray spectroscopy, or ellipsometry.

Gold-coated wafers are also ideal substrates for fabrication of complex electrochemical devices.

selected publications

• Fabrication of photoelectric devices (link).
• Characterization of de-salination membranes (link).
• XPS measurements of molecular sieves (link).
• Molecular force spectroscopy of SAMs (link).
• Fabrication of chemically patterned surfaces (link).