Silicon Wafers with 100 nm Gold (12 wafers)


Substrate: Prime Grade Silicon Wafer (100-mm dia., 525-µm thick)

Metal Layer: Gold, 100-nm

Gold Purity: 99.999%

Adhesion Layer: Titanium, 5-nm

Quantity: Twelve (12) gold-coated silicon wafer

In stock

SKU: AU.1000.SL2 Categories: ,


High purity gold (99.999%) exhibits high electrical conductivity and high reflectivity.

Our gold coated wafers feature a thin titanium adhesion layer to ensure proper adhesion of the gold layer to the silicon substrate.

This product can be used as a substrate for analytical characterization of thin films, nanoparticles, proteins and self-assembled monolayers via electrochemistry, IR spectroscopy, Raman spectroscopy, X-ray spectroscopy, or ellipsometry.

Gold-coated wafers are also ideal substrates for fabrication of complex electrochemical devices.

selected publications
  • Fabrication of photoelectric devices (link).
  • Characterization of de-salination membranes (link).
  • XPS measurements of molecular sieves (link).
  • Molecular force spectroscopy of SAMs (link).
  • Fabrication of chemically patterned surfaces (link).