Wet etching is a technique to pattern metal films into functional devices. A metal film covered with a patterned photoresist is submerged into a liquid that selectively removes exposed areas of the metal. This form of etching is an isotropic method, meaning that the metal is removed with equal rate all directions.
Category: Photolithography
Industries in which nanoparticles can interfere with manufacturing processes need to use a clean room to maintain the utmost accuracy. Cleanrooms control the humidity, contamination, temperature, and pressure of facilities.
Patterned thin films have had an enormous impact on modern technology, and though semiconducting elements typically grab the spotlight, metal surfaces have played a crucial role in various advanced applications such as materials characterization, biosensors, chemical sensors and microelectro-mechanical systems (MEMS).
Photolithography is an important microfabrication technique used to pattern substrates for modern electronics, sensors, and microfluidics. It is a precise form of custom surface fabrication where the interface of a wafer is coated with a light-sensitive polymer known as a photoresist. The coated wafer is then exposed to light which is selectively attenuated by a mask, leaving behind a latent image which is chemically, physically, or optically etched to provide a permanent micro-structured pattern on the wafer’s surface. Coupled with metal deposition and etching techniques, photolithography is a versatile method for fabricating microstructures for optics, chemical and bio-sensors, and microfluidic devices.
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