Biological Testing with Patterned Electrodes

Characterizing and testing biological samples can be done through patterned electrodes. The overall structure and quality of an electrode can either enhance or impinge on sampling results. An ideal electrode design should attain a high signal-to-noise ratio (SNR), a low electrode impedance, and display resistance to harsh biological environments. Current generation and transportation depend on the metal coating present on an electrode surface.

Thin Film Interference Effects

During the photolithography process, thin film interference effects can influence a substrates surface properties. Common interference effects include the standing wave effect, reflective notching, edge bead formation, and under/over baking. The Platypus Technologies engineers have enhanced our standard operating procedures to account for potential defects caused by thin film interference effects.

Photolithography based Lift-off

Lift-off is often conducted following a series of photolithography steps that create a photoresist layer onto a substrate. Chemical and metal lift-off methods are used to create distinctive patterns onto a surface. Both types of lift-offs can be time consuming compared to wet etching, however lift-off is a safer method that offers lower production costs and enhanced processing capabilities.

Wet Etching

Wet etching is a technique to pattern metal films into functional devices. A metal film covered with a patterned photoresist is submerged into a liquid that selectively removes exposed areas of the metal.  This form of etching is an isotropic method, meaning that the metal is removed with equal rate all directions.